2nd Annual Simax Lithography Applications Workshop at SVTC

The 2nd Annual Simax Applications workshop at SVTC, “Processes and Metrology for Emerging Applications” was a great success with record attendance. The presentations covered a wide range of Applications and Metrology topics including: MEMS, LED, Bio, GaAs, and Photonics.

The guest speakers, from HP, AZ, Triquint, Nanometrics, SVTC, DIMES, CPFC, Atmel, Benchmark and Incom, provided the audience with valuable insights into new developments and industry trends. The presentations were all aligned to the main theme of the workshop: “Back to the future”; where going “back” to rediscover legacy systems, and using them to develop “future products”, resonated strongly with the audience. This is actually independent of type of lithography system used, be it GCA, Ultratech, Canon, Nikon, ASML equipment as used in volume fabs or any other equipment, i.e. e-beam, imprint as used in R&D environments.

The Applications workshop quest now begins again, in preparation for next year’s event, to collect informative talks from industry and universities that provide the “more than Moore” community with a unique networking and information resource.

With its continued success, and increased level of interest, the Simax Lithography Applications workshop will be extended to Semicon China, March 2012. “China, with its tremendous growth in the “more than Moore” markets is the next logical step for our Applications workshop. There are many new challenges in LEDs, MEMS and III-V Applications that will make this a very compelling event” said Keith Best.

Press Contact
Keith Best (Mr.)
VP of Applications
Mobile: +1 (408) 621 3390

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