Ultimately, imaging is the crux of the photolithography engineer’s job. With Simax’s “Imaging Plus”, a substantial knowledge base and set of tools exist to bring your products to fruition in the most efficient manner. Our Simax engineers have 20+ years dealing with the most sophisticated aspects of imaging, such as CDU across stitched arrays, ultimate resolution beyond the systems specs, as well as the optimum design and use of phase shift masks. Simax engineers will guide you in the use of best practices and methods, employing simulation, and the design of customized imaging test reticles. The optimization of resist thickness and the integration of BARCs will reduce optical interference to ensure excellent CDU.

Simax has developed additional methodology for functionally evaluating the impact of NA on depth of focus and exposure latitude. Increasing the exposure latitude by NA optimization has been shown to increase yields by 2% and has reduced reworks by 7%.

As an added plus, Simax has an extensive R&D network that will compliment your product development using remote state-of-the-art facilities.

The “Imaging Plus” Application Package

• Access to Advanced Simulation Services for the optical and chemical aspects of photolithographic materials and illumination wavelengths
• Customized imaging reticles
• Expert Apps Engineers to assist you onsite or though Simax R&D Network

Benefits

• Perfectly suited for Photonics, TFH, T-Gate, MEMS, and e-beam replacement
• Helps you meet new product roadmap milestones ahead of schedule
• Proof of concept for new devices
• Maximum ROI
• Yield enhancements from improved CDU
• Each reticle can be used on ASML, Nikon, and Canon systems, allowing cross-platform characterization
• Optimal resist recipes system settings for best imaging performance