Due to the popularity of the "Best solutions" article "small wafers and wafer pieces", December, 2009, Simax Lithography is pleased to announce the development of a new and improved, Simax Lithography Silicon based holder solution.

 

Improved wafer holders

In my first Simax Lithography Apps blog, we discussed the handling of small wafers and pieces by mounting them on holders. This early work paved the way for a new holder design, that provides vacuum to enhance across wafer CDU. This new method takes advantage of deep trench RIE technology to fashion an exposure chuck surface, with suitable vacuum and support rings/pimples, fully integrated with positioning pins and a clamping assembly - essentially allowing the wafers to travel through the lithography exposure system with their own exposure chuck. We have been working on this concept with a number of customers, and whilst a simple modification to our orginal approach, it appears to be very effective.

Moreover, this solution allows the user to run Gold, Glass, III-V and CMOS wafers, without the risk of contaminating the lithography system.

For more information about our new improved wafer holders, please This e-mail address is being protected from spambots. You need JavaScript enabled to view it. at simaxlithography.com